37.
Qi, H., Gee, P. E., and
Hicks, R. F., "Sites for Arsine Adsorption on GaAs (001)," Surf.
Sci. 347, 289-302, 1996.
38.
Kappers, M. J., McDaniel,
A. H., and Hicks, R. F., "Controlling the Group II Composition in CdZnTe
Alloys Grown by Organometallic Vapor-Phase Epitaxy: A Kinetic Model," J.
Crystal Growth 160, 310-319, 1996.
39.
Adamson,
S. D., Han, B. K., and Hicks, R. F., "Site-specific Reaction Kinetics
for Gallium Arsenide Metalorganic Vapor-Phase Epitaxy," Appl. Phys.
Lett., 3236-3239, 69, 1996.
40.
Au,
W. K., Kappers, M. J., and Hicks, R. F., "Evaluation of a Zero-Discharge
Reactor for the Metalorganic Chemical Vapor Deposition of Mercury
Telluride," J. Crystal Growth 174, 386-392, 1997.
41.
Wilkerson, K. J.,
Kappers, M. J., and Hicks, R. F., "Reaction Chemistry of Zinc Telluride
Metalorganic Vapor-Phase Epitaxy," J. Phys. Chem. A, 101,
2451-2458, 1997.
42.
Kappers, M. J.,
Wilkerson, K. J., and Hicks, R. F., "Effects of Ligand Exchange
Reactions on the Composition of Cd1-yZnyTe Grown by
Metalorganic Vapor-Phase Epitaxy," J. Phys. Chem. B, 101,
4882-4888, 1997.
43.
Kappers,
M. J., Warddrip, M. L., Wilkerson, K. J., and Hicks, R. F., "Ligand
Exchange Reactions in Organometallic Vapor-Phase Epitaxy," J.
Electron. Mater., 26, 1169-1174, 1997.
44.
Warddrip,
M. L., Kappers, M. J., Li, L., Qi, H., Han, B. K., Gan, S., and Hicks, R. F.,
"Mechanism of Doping Gallium Arsenide with Carbon Tetrachloride During
Organometallic Vapor-Phase Epitaxy," J. Electron. Mater., 26,
1189-1194, 1997.
45.
Han,
B. K., Li, L., Kappers, M. J., Hicks, R. F., Yoon, H., Goorsky, M. S., and
Higa, K. T., "Characterization of InGaAs/GaAs(001) Films Grown by
Metalorganic Vapor-Phase Epitaxy," J. Electron. Mater., 27,
81-84, 1998.
46.
Li, L, Gan, S., Han,
B.K., Qi, H., and Hicks, R. F., "The Reaction of Carbon Tetrachloride
with Gallium Arsenide (001)," Appl. Phys. Lett., 72,
951-953, 1998.
47.
Gan, S., Li, L., Nguyen,
T., Qi, H., and Hicks, R. F., "Scanning-Tunneling Microscopy of
Chemically Cleaned Germanium (100) Surfaces," Surf. Sci., 395,
69-74, 1998.
48.
Li,
L., Han, B. K., Gan, S., Qi, H., and Hicks, R. F., "Observation of the Atomic
Surface Structure of GaAs (001) Films Grown by Metalorganic Chemical Vapor
Deposition," Surf. Sci., 398, 386-394, 1998.
49.
Li, L, Han, B. K., Hicks,
R. F., Yoon, H., and Goorsky, M. S., "Atomic Structure of the InxGa1-xAs/GaAs
(001) (2x4) and (3x2) Surfaces," Ultramicroscopy, 73,
229-235, 1998.
50.
Li, L., Qi, H. Gan, S.,
Han, B. K., and Hicks, R. F., "Site-Specific Chemistry of Carbon
Tetrachloride Decomposition on GaAs(001)," Appl. Phys. A. 66,
S501-S505, 1998.
51.
Han, B. K., Li, L, Fu,
Q., and Hicks, R. F., "Structure and Composition of the c(4x4)
Reconstruction Formed During Gallium Arsenide Metalorganic Vapor-Phase
Epitaxy," Appl. Phys. Lett. 72, 3347-3349, 1998.
52.
Jeong, J. Y., Babayan,
S. E., Tu, V. J., Henins, I., Velarde, J., Selwyn, G. S., and Hicks, R. F.,
"Etching Materials with an Atmospheric-Pressure Plasma Jet," Plasma
Sources Sci. and Tech. 7, 282-285, 1998.
53.
Babayan, S. E., Jeong,
J. Y., Tu, V., Selwyn, G. S., and Hicks, R. F., "Deposition of Glass
Films with an Atmospheric-Pressure Plasma Jet," Plasma Sources
Sci. and Tech. 7, 286-288, 1998.
54.
Gan, S., Li, L., and
Hicks, R. F., "Characterization of Dislocations in Germanium Substrates
Induced by Mechanical Stress," Appl. Phys. Lett. 73,
1068-1070, 1998.
55.
Li, L., Han, B. K., and
Hicks, R. F., "Surface Phases of GaAs and InAs (001) Found in the
Metalorganic Vapor-Phase Epitaxy Environment," Appl. Phys. Lett. 73,
1239-1241, 1998.
56.
Kappers, M. J., Warddrip,
M. L., and Hicks, R. F., "Ligand Exchange Reactions in InGaAs
Metalorganic Vapor-Phase Epitaxy," J. Crystal Growth, 191,
332-340, 1998.
57.
Begarney, M. J.,
Warddrip, M. L., Kappers, M. J., and Hicks, R. F., "Kinetics of Carbon
Tetrachloride Decomposition During the Metalorganic Vapor-Phase Epitaxy of Gallium
Arsenide and Indium Arsenide," J. Crystal Growth, 193,
305-315, 1998.
58.
Schütze, A., Jeong, J.
Y., Babayan, S. E., Park, J., Selwyn, G. S., and Hicks, R. F., "The
Atmospheric-Pressure Plasma Jet: A Review and Comparison to other Plasma
Sources," IEEE Trans. Plasma Sci., 26, 1685-1694, 1998.
59.
Li, L., Han, B. K., Law, D., Begarney, M.
J., and Hicks, R. F., "Gallium Arsenide and Indium Arsenide Surfaces
Produced by Metalorganic Vapor-Phase Epitaxy," J. Crystal Growth,
195, 28-33, 1998.
60.
Gan, S., Li, L.,
Begarney, M. J., Law, D., Han, B. K., and Hicks, R. F., "Step Structure
of Arsenic-Terminated Vicinal Ge (100)," J. Appl. Phys., 85
2004-2006, 1999.
61.
Li, L., Han, B. K., Fu,
Q., and Hicks, R. F., "An Example of a Compound Semiconductor Surface
that Mimics Silicon: The InP (001) (2x1) Reconstruction," Phys. Rev.
Lett. 82, 1879-1882, 1999.
62.
Hicks, R. F., Qi, H., Fu,
Q., Han, B. K., and Li, L., "Hydrogen Adsorption Sites on GaAs (001)
Reconstructions," J. Chem. Phys. 110, 10498-10508, 1999.
63.
Begarney, M.
J., Li, L., Han, B.-K., Law, D. C., Li, C., Yoon, H., Goorsky, M. S., and
Hicks, R. F., "Formation of Etch Pits during Carbon Doping of Gallium
Arsenide with Carbon Tetrachloride by Metalorganic Vapor-Phase Epitaxy,"
J. Appl. Phys. 86, - ,1999.
64.
Li, L., Han B. -K., Law,
D, Li, C. H., Fu, Q., and Hicks, R. F., “A Phosphorous-Rich Structure of
InP(001) Produced by Metalorganic Vapor-Phase Epitaxy,” Appl. Phys. Lett. 75,
683-685, 1999.
65.
Fu, Q., Li, L.,
Begarney, M. J., Han, B.-K., Law, D. C. and Hicks, R. F., "Site-Specific
Chemistry of Gallium Arsenide Metalorganic Chemical Vapor Deposition," J.
Phys. IV France 9, 3-14,1999.
66.
Jeong, J. Y., Babayan,
S. E., Schütze, A., Tu, V. J., Park, J. Y., Henins, I., Selwyn, G. S., and
Hicks, R. F., "Etching Polyimide with a Non-Equilibrium
Atmospheric-Pressure Plasma Jet," J. Vac. Sci. Technol. A 1. 17, 2581-2585, Sep/Oct 1999.
67.
Park, J., Henins, I.,
Herrmann, H. W., Selwyn, G. S., Jeong, J. Y., Hicks, R. F., Shim, D., Chang,
C. S., "An Atmospheric Pressure Plasma Source," Appl. Phys.
Lett. 76(3), 288-290, 2000.
68.
Li,
L., Fu, Q., Han, B. -K., Li, C. H., and Hicks, R. F., “Determination of
Indium Phosphide (001) Surface Reconstructions by Scanning Tunneling
Microscopy and Infrared Spectroscopy of adsorbed hydrogen,” Phys. Rev. B, 61, 10 223-10228,
2000.
69.
Fu, Q., Li, L., and
Hicks, R. F., "Ab Initio Cluster Calculations of Hydrogenated
GaAs (001) Surfaces", Phys. Rev. B,
61, 11 034-11 040, 2000.
70.
Fu, Q., Li, L., Li, C.
H., Law, D. C., Begarney, M. J., and Hicks, R. F., "Arsine Adsorption on
the Gallium-Rich GaAs (001) (4x2) Surface," J. Phys. Chem. B, 104,
5595-5602, 2000.
71.
Law, D. C., Li, L.,
Begarney, M. J., Hicks, R. F., "Analysis of the growth modes for gallium
arsenide metalorganic vapor-phase epitaxy".
J. Appl. Phys., 88,
508-512, 2000.
72.
Jeong, J. Y., Park, J.
Y. Henins, I., Babayan, S. E., Tu, V. J., Selwyn, G. S., Ding, G., and Hicks,
R. F., "Reaction Chemistry in the Afterglow of an Oxygen-Helium,
Atmospheric-Pressure Plasma," J. of Phys. Chem. A; 104(34);
8027-8032, 2000.
73.
Tu, V. J., Jeong, J.
Y., Schütze, A., Babayan, S. E., Selwyn, G. S., Ding, G., and Hicks, R. F.,
“Tantalum Etching with a Non-Thermal Atmospheric-Pressure Plasma,” J. Vac.
Sci. Technol. A 18, 2799-2805, 2000.
74. Begarney, M. J., Li, L.,
Li, C. H., Law, D. C., Fu, Q., and Hicks, R. F., “Reflectance-Difference
Spectroscopy of Mixed Arsenic-Rich Phases of Gallium Arsenide (001),” Phys. Rev. B, 62, 8092-8097, 2000.
75. Li, C. H., Li, L., Fu, Q.
Begarney, M. J., and Hicks, R. F., “Stress-Induced Anisotropy of Phosphorous
Islands on Gallium Arsenide,” Appl.
Phys. Lett.,77, 2139-2141, 2000.
76.
Park, J., Henins, I.,
Herrmann, H. W., Selwyn, G. S., Hicks, R. F., "Discharge Phenomena of an
Atmospheric Pressure Radio-Frequency Capacitive Plasma Source," J.
Appl. Phys. 89, 20-28, 2001.
77.
Begarney, M. J.; Li, C.
H.; Law, D. C.; Visbeck, S. B.; Sun, Y.; Hicks, R. F. "Reflectance
Difference Spectroscopy of Mixed Phases of Indium Phosphide (001)." Appl.
Phys. Lett., 78, 55-57, 2001.
78.
Babayan, S. E., Jeong,
J. Y., Schutze, A., Tu, V. J., Moravej, M., Selwyn, G. S., Hicks, R. F.,
"Deposition of Silicon Dioxide Films with a Non-Equilibrium
Atmospheric-Pressure Plasma Jet," Plasma Sources Sci. Technol. 10,
573-578, 2001.
79.
Babayan, S. E., Ding,
G., Hicks, R. F., "Determination of the Nitrogen Atom Density in the
Afterglow of a Nitrogen and Helium, Nonequilibrium, Atmospheric Pressure
Plasma," Plasma Chem. Plasma Process. 21, 505-521, 2001.
80.
Law, D. C., Fu, Q.,
Visbeck, S. B., Sun, Y., Li, C. H., Hicks, R. F. "Hydrogen Atoms
as a Probe of the Optical Anisotropy of Indium Phosphide (001)." Surf.
Sci., 496, 121-128, 2001.
81.
Fu, Q., Negro, E., Chen,
G., Law, D. C., Li, C. H., Hicks, R. F. "Hydrogen adsorption on
phosphorus-rich (2x1) indium phosphide (001)." Phys. Rev. B, 65, 75318-75324, 2002.
82.
Fu, Q., Begarney, M. J.,
Li, C. H., Law, D. C., Hicks, R. F., "Phase Transitions of III-V
Compound Semiconductor Surfaces in the MOVPE Environment," J. Cryst.
Growth 225, 405-409, 2001.
83.
Nowling, G. R., Babayan,
S. E., Jankovic, V., Hicks, R. F., "Remote Plasma-Enhanced Chemical
Vapor Deposition of Silicon Nitride at Atmospheric Pressure," Plasma
Sources Sci. Technol. 11, 97-103, 2002.
84.
Babayan, S. E., Ding,
G., Nowling, G. R., Yang, X., Hicks, R. F., “Characterization of the
Active Species in the Afterglow of a Nitrogen and Helium Atmospheric-Pressure
Plasma," Plasma Chem. Plasma Process. 22, 255-269, 2001.
85.
Chen, G. Visbeck, S. B.,
Law, D. C., and Hicks, R. F., "Structure-Sensitive Oxidation of the
Indium Phosphide (001) Surface," J. Appl. Phys. 91, 9362-9367, 2002.
86.
Li, C. H., Li, L., Law,
D. C., Visbeck, S. B., and Hicks, R. F., “Arsenic Adsorption and Exchange
with Phosphorus on Indium Phosphide (001),” Phys. Rev. B. 65, 205322/1-205322/7, 2002.
87.
Sun, Y., Law, D. C.,
Visbeck, S. B., Hicks, R. F. "Kinetics of Tertiarybutylphosphine
Adsorption and Phosphorus Desorption from Indium Phosphide (001)," Surf.
Sci. 513, 256-262, 2002.
88.
Law, D. C., Sun, Y., Li,
C. H., Visbeck, S. B., Chen, G., and Hicks, R. F., “Structure of
Arsenic-Treated Indium Phosphide (001) Surfaces During Metalorganic
Vapor-Phase Epitaxy,” Phys. Rev. B, 66, 45314-45321, 2002.
89.
Raghavachari, K., Fu,
Q., Chen, G., Li, L., Li, C. H., Law, D. C., and Hicks, R. F., "Hydrogen
Adsorption on the Indium-Rich Indium Phosphide (001) Surface: A Novel Way to
Produce Bridging In-H-In Bonds," J. Am. Chem. Soc. 124, 15119-15124,
2002.
90.
Li, C. H., Sun, Y.,
Visbeck, S. B., Law, D. C., and Hicks, R. F., "Reflectance Difference
Spectroscopy of an Ultra-Thin Indium Arsenide Layer on Indium Phosphide
(001)," Appl. Phys. Lett. 81, 3939-3941, 2002.
91.
Sun, Y., Law, D. C., and
Hicks, R. F., "Kinetics of phosphine adsorption and phosphorus
desorption from gallium and indium phosphide (001)," Surf. Sci. 540,
12-22, 2003.
92.
Li, C. H., Law, D. C.,
Sun, Y., Visbeck, S. B., and Hicks, R. F., “The (√3×√3)R30o
Reconstruction of the InP (111)A Surface,”
Phys. Rev. B 68, 085320-1-5, 2003.
93.
Yang, X., Babayan, S.
E., and Hicks, R. F., "Measurement of the fluorine atom concentration in
a carbon tetrafluoride and helium atmospheric-pressure plasma," Plasma
Sources Sci. Technol. 12, 484-488, 2003.
94.
Chen, G., Cheng, S. F.,
Tobin, D. J., Li, L., Raghavachari, K., and Hicks, R. F., "Indium
Phosphide (001)-(2x1): Evidence for a Hydrogen-Stabilized Surface
Reconstruction," Phys. Rev. B, Rapid Comm. 68, 121303-1-3,
2003.
95.
Law, D. C., Sun, Y., and
Hicks, R. F., "Reflectance difference spectroscopy of gallium phosphide
(001) surfaces," J. Appl. Phys. 94, 6175-6180, 2003.
96.
Moravej, M., Babayan, S.
E., Nowling, G. R., Yang, X., and Hicks, R. F., "Plasma Enhanced
Chemical Vapor Deposition of Hydrogenated Amorphous Silicon at Atmospheric
Pressure," Plasma Sources Sci. Technol., 13, 8-14, 2004.
97.
Yang, X., Moravej, M.,
Babayan, S. E., Nowling, G. R., and Hicks, R. F., "Etching of Uranium
Oxide with a Non-Thermal, Atmospheric Pressure Plasma," J. Nucl.
Mater. 324, 134-139, 2004.
98.
Nowling, G. R., Yang, X., Moravej, M., Agarwal, R., and Hicks, R. F.,
"The Reactions of Silane in the Afterglow of a Helium-Nitrogen
Plasma,"
Plasma Sources Sci.
Technol. 13, 156-163, 2004.
99.
Moravej, M., Babayan, S.
E., Yang, X., Nowling, G. R., and Hicks, R. F., “Physics of high-pressure
helium and argon radio-frequency plasmas,” J. Appl. Phys. 96,
7011-7017, 2004.
100.
Chen G., Cheng D., Hicks
R. F., Noori A. M., Hayashi S. L., Goorsky M. S., Kanjolia R., and Odedra
R., "Metalorganic Vapor-phase Epitaxy of III/V Phosphides with
Tertiarybutylphosphine and Tertiarybutylarsine," J. Crystal Growth,
270, 322-328, 2004.
101. Sun, Y., Cheng, S. F.,
Chen, G., Hicks, R. F., Cederberg, J. G. and Biefeld, R. M., “The role of
antimony in the growth of indium arsenide quantum dots in gallium arsenide
(001),” J. Appl. Phys. 97, 053503-1-6, 2005.
102.
Nowling, G. R.
Yajima, M., Babayan, S. E., Moravej, M., Yang, X., Hoffman, W., and Hicks, R.
F., “Chamberless Plasma Deposition of Glass Coatings on Plastic,” Plasma
Sources Sci. Technol., 14, 477-484, 2005.
103.
Yang, X., Moravej,
M., Nowling, G. R., Chang, J. P., and Hicks, R. F., “Operating Modes of an
Atmospheric Pressure Radio-Frequency Plasma,” IEEE Trans. Plasma Sci., 33(2),
294-295, 2005.
104.
Yang, X., Moravej,
M., Nowling, G. R., Babayan, S. E., Penelon, J., Chang, J. P., and Hicks, R.
F., “Comparison of an Atmospheric Pressure, Radio-Frequency Discharge
Operating in the a and g Modes,” Plasma Sources Sci. Technol. 14,
314-320, 2005.
105.
Moravej, M., and
Hicks, R. F., “Atmospheric Plasma Deposition of Coatings Using a Capacitive
Discharge Source,” Chemical Vapor Deposition, accepted March 17, 2005.
106.
Yang, X., Moravej,
M., Babayan, S. E., Nowling, G. R., and Hicks, R. F., “High Stability of
Atmospheric Pressure Plasmas Containing Carbon Tetrafluoride and Sulfur
Hexafluoride,” Plasma Sources Sci. Technol., 14, 412-418, 2005.
107.
Sun, Y., Cheng, S. F.,
Chen, G., Woo, R. L., and Hicks, R. F., “The Structure of Indium Phosphide
(001) Treated with Trimethylantimony in a Metalorganic Vapor-Phase Epitaxy
Reactor,” J. Appl. Phys., 97, 103512-1-5, 2005.