Recent Publications
II-VI Materials
for Devices |
Correlation between nuclear response
and defects in CZT, Hermon, H.; Schieber, M.; James,
R.B.; Lee, E.; Cross, E.; Goorsky, M.; Lam, T.; Schlesinger,
T.E.; Greaves, M., Proceedings of the SPIE
- The International Society for Optical Engineering, vol.3768,
(Hard X-Ray, Gamma-Ray, and Neutron Detector Physics, Denver,
CO, USA, 19-23 July 1999.) SPIE-Int.
Soc. Opt. Eng, 1999. p.138-46. 16 references.
Shear deformation and strain relaxation
in HgCdTe on (211) CdZnTe, T.T. Lam, C.D. Moore, R.L.
Forrest, M.S. Goorsky, S.M. Johnson, D.B. Leonard, T.A. Strand,
T.J. deLyon and M.D. Gorwitz, J.
Electon. Mater., vol. 29, (no.6), (1999 U.S. Workshop on the
Physics and Chemistry of II-VI Materials, Las Vegas, NV, USA, 22-24
Sept. 1999.) TMS; IEEE, June 2000. p. 804-8.
Homogeneity of CdZnTe detectors, Hermon,
H.; Schieber, M.; James, R.B.; Lund, J.; Antolak, A.J.; Morse,
D.H.; Kolesnikov, N.N.P.; Ivanov, Y.N.; Goorsky, M.S.; Yoon,
H.; Toney, J.; Schlesinger, T.E., Nucl.
Instrum. Methods Phys. Res. A, Accel. Spectrom. Detect. Assoc.
Equip. Netherlands , vol.410, no.1, 1998. p.100-6.
Lead iodide X-ray and gamma-ray
spectrometers for room and high temperature operation, Hermon,
H.; James, R.B.; Lund, J.; Cross, E.; Antolak, A.; Morse, D.H.;
Medlin, D.L.; Soria, E.; Van Scyoc, J.; Brunett, B.; Schieber,
M.; Schlesinger, T.E.; Toney, J.; Goorsky, M.; Yoon, H.; Burger,
A.; Salary, L.; Chen, K.-T.; Chang, Y.-C.; Shah, K., in Semiconductors
for Room-Temperature Radiation Detector Applications II,
edited by: James, R.B.; Schlesinger, T.E.; Siffert, P.; Dusi,
W.; Squillante, M.R.; O'Connell, M.; Cuzin, M. (Warrendale,
PA, USA: Mater. Res. Soc.,
1997). p.361-8.
Properties of zinc selenide
grown by chemical vapor transport and its application to room-temperature
radiation detection, Brunett, B.A.; Toney, J.E.; Yoon, H.;
Rudolph, P.; Schieber, M.; Schlesinger, T.E.; Goorsky, M.S.;
James, R.B., in Semiconductors for Room-Temperature Radiation
Detector Applications II, edited by: James, R.B.; Schlesinger,
T.E.; Siffert, P.; Dusi, W.; Squillante, M.R.; O'Connell, M.;
Cuzin, M. (Warrendale, PA, USA: Mater.
Res. Soc., 1997). p.499-503.
Comparison between cadmium zinc
telluride crystals grown in Russia and in the Ukraine, Hermon,
H.; Schieber, M.; James, R.B.; Yang, N.; Antolak, A.J.; Morse,
D.H.; Kolesnikov, N.N.P.; Ivanov, Yu.N.; Komar, V.; Goorsky,
M.S.; Yoon, H.; Toney, .; Schlesinger, T.E. in Semiconductors
for Room-Temperature Radiation Detector Applications II,
edited by: James, R.B.; Schlesinger, T.E.; Siffert, P.; Dusi,
W.; Squillante, M.R.; O'Connell, M.; Cuzin, M. (Warrendale,
PA, USA: Mater. Res. Soc.,
1997). p.13-18.
Influence of structural defects
and zinc composition variation on the device response of Cd/sub
1-x/Zn/sub x/Te radiation detectors, Yoon, H.; Van Scyoc,
J.M.; Gilbert, T.S.; Goorsky, M.S.; Brunett, B.A.; Lund, J.C.;
Hermon, H.; Schieber, M.; James, R.B., in Semiconductors
for Room-Temperature Radiation Detector Applications II,
edited by: James, R.B.; Schlesinger, T.E.; Siffert, P.; Dusi,
W.; Squillante, M.R.; O'Connell, M.; Cuzin, M. (Warrendale,
PA, USA: Mater. Res. Soc.,
1997). p.115-20.
Study of the homogeneity of
cadmium zinc telluride detectors, Hermon, H.; Schieber,
M.; Yang, N.; James, R.B.; Kolesnikov, N.N.P.; Komar, V.; Goorsky,
M.S.; Yoon, H.; Toney, J.; Schlesinger, T.E., in Semiconductors
for Room-Temperature Radiation Detector Applications II,
edited by: James, R.B.; Schlesinger, T.E.; Siffert, P.; Dusi,
W.; Squillante, M.R.; O'Connell, M.; Cuzin, M. (Warrendale,
PA, USA: Mater. Res. Soc.,
1997). p.223-8.
Mapping high-pressure Bridgman
Cd/sub 0.8/Zn/sub 0.2/Te, Schieber, M.; Hermon, H.; James,
R.B.; Lund, J.; Antolak, A.; Morse, D.; Kolesnikov, N.N.; Ivanov,
Yu.N.; Goorsky, M.S.; Van Scyoc, J.M.; Yoon, H.; Toney, J.;
Schlesinger, T.E.; Doty, F.P.; Cozzatti, J.P.D., IEEE Trans.
Nucl. Sci., vol.44, no.6, pt.3, 1997. p.2566-70.
Investigation of the effects
of polishing and etching on the quality of Cd/sub 1-x/Zn/sub
x/Te using spatial mapping techniques, Yoon, H.; Van Scyoc,
J.M.; Goorsky, M.S.; Hermon, H.; Schieber, M.; Lund, J.C.; James,
R.B., J.
Electron. Mater., vol.26, no.6, 1997. p.529-33.
Growth and characterization
of p-type Cd/sub 1-x/Zn/sub x/Te x 0.2, 0.3, 0.4, Kolesnikov,
N.N.; Kolchin, A.A.; Alov, D.L.; Ivanov, Yu.N.; Chernov, A.A.;
Schieber, M.; Hermon, H.; James, R.B.; Goorsky, M.S.; Yoon,
H.; Toney, J.; Brunett, B.; Schlesinger, T.E., J.
Cryst. Growth, vol.174, no.1-4, 1997. p.256-62.
Evaluation of Russian-grown
Cd/sub0.8/Zn/sub 0.2/Te, Schieber, M.M.; Hermon, H.; James,
R.B.; Lund, J.C.; Antolak, A.J.; Morse, D.H.; Kolesnikov, N.N.;
Ivanov, Yu.N.; Goorsky, M.S.; Yoon, H.; Toney, J.E.; Schlesinger,
T.E., Proc. SPIE - Int. Soc. Opt. Eng., vol.3115, Hard X-Ray
and Gamma-Ray Detector Physics, Optics, and Applications, 1997.
p.305-10.
X-ray diffuse scattering for
evaluation of wide bandgap semiconductor nuclear radiation detectors,
Goorsky, M.S.; Yoon, H.; Schieber, M.; James, R.B.; McGregor,
D.S.; Natarajan, M., Nucl.
Instrum. Methods Phys. Res. A, Accel. Spectrom. Detect. Assoc.
Equip., vol.380, no.1-2 , Room Temperature Semiconductor
X- and -Ray Detectors, Associated Electronics and Applications,
1996. p.6-9.
Material analysis and characterization
on zone refined and zone leveled vertical zone melt GaAs for
radiation spectrometers, McGregor, D.S.; Antolak, A.J.;
Cross, E.S.; Fang, Z.-Q.; Goorsky, M.S.; Henry, R.L.; James,
R.B.; Look, D.C.; Mier, M.G.; Morse, D.H.; Nordquist, P.E.R.;
Olsen, R.; Schieber, M.; Schlesinger, T.E.; Soria, E.; Toney,
J.E.; Van Scyoc, J.; Yoon, H., Nucl.
Instrum. Methods Phys. Res. A, Accel. Spectrom. Detect. Assoc.
Equip., vol.380, no.1-2 , Room Temperature Semiconductor
X- and –Ray Detectors, Associated Electronics and Applications.
1996. p.84-7.
Uniformity of Cd/sub 1-x/Zn/sub
x/Te grown by high-pressure, Bridgman, Toney, J.E.; Brunett,
B.A.; Schlesinger, T.E.; van Scyoc, J.M.; James, R.B.; Schieber,
M.; Goorsky, M.; Yoon, H.; Eissler, E.; Johnson, C., Nucl.
Instrum. Methods Phys. Res. A, Accel. Spectrom. Detect. Assoc.
Equip., vol.380, no.1-2 , Room Temperature Semiconductor
X- and -Ray Detectors, Associated Electronics and Applications,
1996. p.132-5.
Characterization of lead iodide
for nuclear spectrometers, Schlesinger, T.E.; James, R.B.;
Schieber, M.; Toney, J.; Van Scyoc, J.M.; Salary, L.; Hermon,
H.; Lund, J.; Burger, A.; Chen, K.-T. Cross, E.; Soria, E.;
Shah, K.; Squillante, M.; Yoon, H.; Goorsky, M., Nucl.
Instrum. Methods Phys. Res. A, Accel. Spectrom. Detect. Assoc.
Equip., vol.380, no.1-2 , Room Temperature Semiconductor
X- and -Ray Detectors, Associated Electronics and Applications,
1996. p.193-7.
Defect characterization of etch
pits in ZnSe based epitaxial layers, U'Ren, G.D.; Goorsky,
M.S.; Meis-Haugen, G.; Law, K.K.; Miller, T.J.; Haberern, K.W.,
Appl. Phys. Lett., vol.69,
no.8, 1996. p.1089-91.
Material inhomogeneities in
Cd/sub 1-x/Zn/sub x/Te and their effects on large volume gamma-ray
detectors, Van Scyoc, J.M.; Lund, J.C.; Morse, D.H.; Antolak,
A.J.; Olsen, R.W.; James, R.B.; Schieber, M.; Yoon, H.; Goorsky,
M.S.; Toney, J.; Schlesinger, T.E., J.
Electron. Mater., vol.25, no.8, 1996. p.1323-7.
Mapping high pressure Bridgman
Cd/sub 0.8/Zn/sub 0.2/Te from Russia, Schieber, M.; Hermon,
H.; James, R.B.; Lund, J.; Antolak, A.; Morse, D.; Kolesnikov,
N.N.; Ivanov, Yu.N.; Goorsky, M.S.; Van Scyoc, J.M.; Yoon, H.;
Toney, J.; Schlesinger, T.E.; Doty, F.P.; Cozzatti, J.P.D.,
vol.1 , in IEEE Nuclear Science Symposium, edited by:
Del Guerra, A. (New York, NY, USA: IEEE, 1996). p.647-50.
Nondestructive analysis of structural
defects in wide bandgap II-VI heterostructures, Goorsky,
M.S.; Lindo, S.E.; Guha, S.; Haugen, G.M., J.
Electron. Mater., vol.25, no.2, 1996. p.235-8.
Bulk and surface stoichiometry
of vapor grown mercuric iodide crystals, Schieber, M.; Roth,
M.; Yao, H.; DeVries, M.; James, R.B.; Goorsky, M., J.
Cryst. Growth, vol.146, no.1-4, 1995. p.15-22.
Room temperature polarized photoreflectance
characterization of GaAlAs/InGaAs/GaAs high electron mobility transistor
structures including the influence of strain relaxation, Chen, T.H.; Huang, Y.S.; Lin, D.Y.; Pollak, F.H.; Goorsky, M.S.;
Streit, D.C.; Wojtowicz, M.
Journal of Applied
Physics, vol.88, (no.2), AIP, 15 July 2000. p.883-8.
Lattice tilt and relaxation in InGaP/GaAs/Ge solar cells on
miscut substrates, Hess, R. R.; Moore,
C. D.; Goorsky, M. S., J.
Phys. D, vol. 32, no. 10A, 1999. p.A16-A20.
Atomic structure of In/sub x/Ga/sub
1-x/As/GaAs 001 2*4 and 3*2 surfaces, Li, L.; Han, B.K.;
Hicks, R.F.; Yoon, H.; Goorsky, M.S., Ultramicroscopy, vol.73,
no.1-4, 1998. p.229-35.
Characterization of InGaAs/GaAs
001 films grown by metalorganic vapor phase epitaxy using alternative
sources, Han, B.-K.; Li, L.; Kappers, M.J.; Hicks, R.F.;
Yoon, H.; Goorsky, M.S.; Higa, K.T., J.
Electron. Mater., vol.27, no.2, 1998. p.81-4.
The role of substrate quality
on misfit dislocation formation in pseudomorphic high electron
mobility transistor structures, Meshkinpour, M.; Goorsky,
M.S.; Jenichen, B.; Streit, D.C.; Block, T.R., J.
Appl. Phys., vol.81, no.7,1997. p.3124-8.
Evaluating epitaxial growth
stability, Christensen, D.H.; Hill, J.R.; Hickernell, R.K.;
Matney, K.; Goorsky, M.S., Mater.
Sci. Eng. B, Solid-State Mater. Adv. Technol., vol.44, no.1-3,
1997. p.113-16.
Effect of interface defect formation
on carrier diffusion and luminescence in In/sub 0.2/Ga/sub 0.8/As/Al/sub
x/Ga/sub 1-x/As quantum wells, Rich, D.H.; Rammohan, K.;
Lin, H.T.; Tang, Y.; Meshkinpour, M.; Goorsky, M.S., J.
Vac. Sci. Technol. B, Microelectron. Nanometer Struct. ,
vol.14, no.4 , 1996. p.2922-35.
The investigation of custom
grown vertical zone melt semi-insulating bulk gallium arsenide
as a radiation spectrometer, McGregor, D.S.; Antolak, A.J.;
Chui, H.C.; Cross, E.S.; Fang, Z.-Q.; Flatley, J.E.; Goorsky,
M.S.; Henry, R.L.; James, R.B.; Look, D.C.; Mier, M.G.; Morse,
D.H.; Nordquist, P.E.R.; Olsen, R.W.; Pocha, M.; Schieber, M.;
Schlesinger, T.E.; Soria, E.; Toney, J.E.; Van Scyoc, J.; Yoon,
H.; Wang, C.L., IEEE Trans. Nucl. Sci. USA , vol.43, no.3, pt.2,
(IEEE, 1996). p.1397-406.
Complete p-type activation in
vertical-gradient freeze GaAs co-implanted with gallium and
carbon, Horng, S.T.; Goorsky, M.S., Appl.
Phys. Lett., vol.68, no.11, 1996. p.1537-9.
Degradation of InGaAs high electron
mobility transistors: the role of channel composition and thickness,
Meshkinpour, M.; Goorsky, M.S.; Streit, D.C.; Block, T.R.; Wojtowicz,
M., Symposium, Defect and Impurity Engineered Semiconductors
and Devices, edited by: Ashok, S.; Chevallier, J.; Akasaki,
I.; Johnson, N.M.; Sopori, B.L.. (Pittsburgh, PA, USA: Mater.
Res. Soc, 1995). p.783-7.
Effect of substrate miscut on
the structural properties of InGaAs linear graded buffer layers
grown by molecular-beam epitaxy on GaAs, Eldredge, J.W.;
Matney, K.M.; Goorsky, M.S.; Chui, H.C.; Harris, J.S., Jr.,
J.
Vac. Sci. Technol. B, Microelectron. Nanometer Struct. ,
vol.13, no.2 , 1995. p.689-91.
Diffuse X-ray scattering from
misfit dislocations at semiconductor hetero-interfaces,
Goorsky, M.S.; Meshkinpour, M.; Streit, D.C.; Block, T.R., J.
Phys. D, Appl. Phys., vol.28, no.4A, 1995. p.A92-6.
Role of misfit dislocations
on pseudomorphic high electron mobility transistors, Meshkinpour,
M.; Goorsky, M.S.; Chu, G.; Streit, D.C.; Block, T.R.; Wojtowicz,
M., Appl. Phys. Lett.,
vol.66, no.6 , 1995. p.748-50.
The investigation of custom
grown vertical zone melt semi-insulating bulk gallium arsenide
as a radiation spectrometer, McGregor, D.S.; Antolak, A.J.;
Chui, H.C.; Cross, E.S.; Fang, Z.-Q.; Goorsky, M.S.; Henry,
R.L.; Look, D.C.; Mier, M.G.; Morse, D.H.; Nordquist, P.E.R.;
Olsen, R.W.; Pocha, M.; Schieber, M.; Schlesinger, T.E.; Soria,
E.; Toney, J.E.; Yoon, H.; Wang, C.L., , P.A. in IEEE Nuclear
Science Symposium and Medical Imaging Conference Record,
edited by: Moonier, (New York, NY, USA: IEEE, 1995). p.85-9.
Determining period variations
in a distributed Bragg reflector through high resolution X-ray
analysis, Matney, K.; Goorsky, M.S., J.
Cryst. Growth, vol.148, no.4, 1995. p.327-35.
Period deviations in distributed
Bragg reflectors: X-ray diffraction and optical reflectivity
measurements, Matney, K.; Goorsky, M.S.; Tartaglia, J.;
Rai, R.; Parsons, C., in Proceedings of the Twenty-First
International Symposium on Compound Semiconductors, edited
by: Goronkin, H.; Mishra, U., (Bristol, UK: IOP Publishing,
1995). p.553-8.
Layer tilt and relaxation in
InGaAs/GaAs graded buffer layers, Matney, K.M.; Eldredge,
J.W.; Goorsky, M.S., in Strained Layer Epitaxy - Materials,
Processing, and Device Applications, edited by: Fitzgerald,
E.A.; Hoyt, J.; Cheng, K.-Y.; Bean, J. (Pittsburgh, PA, USA:
Mater. Res. Soc, 1995). p.73-8.
Strain and mosaic spread of
carbon and gallium co-implanted GaAs, Horng, S.T.; Goorsky,
M.S.; Madok, J.H.; Haegel, N.M., J.
Appl. Phys., vol.76, no.4 , 1994. p.2066-9.
Correlation of interface recombination
and dislocation density at GaInP/GaAs heterojunctions, Mullenborn,
M.; Matney, K.; Goorsky, M.S.; Haegel, N.M.; Vernon, S.M., J.
Appl. Phys., vol.75, no.5 , 1994. p.2418-20.
Structural properties of highly
mismatched InGaAs-based devices grown by molecular beam epitaxy
on GaAs substrates, Goorsky, M.S.; Eldredge, J.W.; Lord,
S.M.; Harris, J.S., J.
Vac. Sci. Technol. B, Microelectron. Nanometer Struct. ,
vol.12, no.2, 1994. p.1034-7.
The relationship between InGaAs
channel layer thickness and device performance in high electron
mobility transistors, Meshkinpour, M.; Goorsky, M.S.; Streit,
D.C.; Block, T.; Wojtowicz, M.; Rammohan, K.; Rich, D.H. , in
Compound Semiconductor Epitaxy Symposium, edited by:
Tu, C.W.; Kolodziejski, L.A.; McCrary, V.R. (Pittsburgh, PA,
USA: Mater. Res. Soc, 1994). p.327-32.
Anisotropic structural and electronic
properties of InGaAs/GaAs heterojunctions, Goldman, R.S.;
Rammohan, K.; Raisanen, A.; Goorsky, M.; Brillson, L.J.; Rich,
D.H.; Wieder, H.H.; Kavanagh, K.L., Compound Semiconductor
Epitaxy Symposium, edited by: Tu, C.W.; Kolodziejski, L.A.;
McCrary, V.R. (Pittsburgh, PA, USA: Mater. Res. Soc, 1994).
p.349-54.
Pulsed laser deposition of epitaxial AlN, GaN, and InN thin
films on sapphire 0001, Feiler, D.;
Williams, R.S.; Talin, A.A.; Yoon, H.; Goorsky, M.S., J.
Cryst. Growth , vol.171, no.1-2, 1997. p.12-20.
The role of the low temperature
buffer layer and layer thickness in the optimization of OMVPE
growth of GaN on sapphire, Hersee, S.D.; Ramer, J.; Zheng,
K.; Kranenberg, C.; Malloy, K.; Banas, M.; Goorsky, M., J.
Electron. Mater., vol.24, no.11, 1995. p.1519-23.
Overgrowth of submicron-patterned surfaces for buried index contrast devices,
Koontz, E.M.; Petrich, G.S.; Kolodziejski, L.A.; Goorsky, M.S.
Semiconductor Science and Technology, vol.15, (no.4), IOP Publishing, April
2000. p.R1-12.
Strain compensation in In0.75Ga0.25As/InP pseudomorphic high electron
mobility transistors using strained InAlAs buffers, Goorsky, M.S.; Sandhu, R.; Hsing,
R.; Naidenkova, M.; Wojtowicz, M.; Chin, T.P.; Block, T.R.; Streit, D.C. Journal of
Vacuum Science & Technology B (Microelectronics and Nanometer Structures), vol.18, (no.3),
(18th North American Conference on Molecular Beam Epitaxy, Banff, Alta.,
Canada, 10-13 Oct. 1999.) AIP for American Vacuum Soc, May 2000. p.1658-62.
Diffraction and topography measurements of InP and InP-based
heterostructure devices, Goorsky,
M.S., in Physics of Semiconductor Devices, vol.1,
edited by: Kumar, V.; Agarwal, S.K., (Delhi, India: Narosa Publishing
House, 1998). p.236-43.
Analysis of lattice distortions
in high-quality InGaAsP epitaxial overgrowth of rectangular-patterned
InP gratings, U'Ren, G.D.; Goorsky, M.S.; Koontz, E.M.;
Lim, M.H.; Petrich, G.S.; Kolodziejski, L.A.; Wong, V.V.; Smith,
H.I.; Matney, K.M.; Wormington, M., J.
Vac. Sci. Technol. B, Microelectron. Nanometer Struct.,
vol.16, no.3, 1998. p.1381-4.
Preservation of rectangular-patterned
InP gratings overgrown by gas source molecular beam epitaxy,
Koontz, E.M.; Lim, M.H.; Wong, V.V.; Petrich, G.S.; Kolodziejski,
L.A.; Smith, H.I.; Matney, K.M.; U'Ren, G.D.; Goorsky, M.S.,
Appl. Phys. Lett., vol.71,
no.10, 1997. p.1400-2.
Substrate crystallinity and
the performance of InP-based pseudomorphic high electron mobility
transistors, Goorsky, M.S.; Sandhu, R.; Bhasin, G.; Moore,
C.D.; Streit, D.G.; Block, T.R.; Wojtowicz, M., Conference Proceedings.
1997 International Conference on Indium Phosphide and Related
Materials Cat. No.97CH36058, (New York, NY, USA: IEEE, 1997).
p.264-7.
Overgrowth of InGaAsP materials
on rectangular-patterned gratings using GSMBE, Koontz, E.M.;
Lim, M.H.; Wong, V.V.; Petrich, G.S.; Kolodziejski, L.A.; Smith,
H.I.; Goorsky, M.S.; Matney, K.M., Conference Proceedings. 1997
International Conference on Indium Phosphide and Related Materials
Cat. No.97CH36058, (New York, NY, USA: IEEE, 1997). p.62-5.
Surface and Bulk Characterization of Thermally
Induced Defects during Silicon Single Wafer Epitaxy, Petra Feichtinger, Mark S. Goorsky,
Frank Muemmler, Steve Rickborn, Quynh Tran, Dwain Oster and Jim Morel,
submitted for publication in
J. of Crystal Growth (2001).
Misfit Dislocation Nucleation Study in P/P+ Silicon,
P. Feichtinger, M.S. Goorsky, D. Oster, T. D'Silva, and J. Moreland,
accepted for publication in J. Electrochem. Soc.(2001)
Misfit Dislocation Interactions in Low Mismatch P/P+ Silicon,
Petra Feichtinger, Benjamin Poust, Mark .S. Goorsky, Dwain Oster, Juanita Chambers,
and Jim Moreland, accepted for publication in
J.of Physics D (2001)
Misfit dislocation nucleation study in
p/p+ silicon, Petra Feichtinger, Mark S. Goorsky, Dwain
Oster, Tom D'Silva, and Jim Moreland, in High Purity Silicon VI,
C.L. Claeys, P. Rai-Choudhury, M. Watanabe, P. Stallhofer, and H.J. Dawson,
Editors, p.136 The
Electrochemical Society, Pennington, NJ (2000).
Ion implantation effect on dislocation
propagation in pseudomorphically strained p/p+ silicon,
Petra Feichtinger, Ben Poust, Hiroaki Fukuto, Rajinder Sandhu,
Mark S. Goorsky, Dwain Oster, Steve F. Rickborn, and Jim Moreland,
accepted for publication in Si Front-End Processiing-Physics
and Technology of Dopant-Defect Interactions II, A. Agarwal,
L. Pelaz, H.-H. Vuong, P.A. Packan, and M. Kase, Editors,
Materials Research Society,
Pittsburgh NJ 2000.
Ion implantation and misfit dislocation
formation in p/p+ silicon, Petra Feichtinger, Hiroaki
Fukuto, Rajinder Sandhu, Benjamin Poust, and Mark S. Goorsky,
accepted for publication in Thin Films-Stresses and Mechanical
Properties VIII, R. Vinci, P. Besser, O. Kraft, N. Moody,
and E. Shaffer, Editors, p.37 Materials
Research Society, Pittsburgh NJ 1999.
X-ray topography and diffraction studies
of misfit dislocation nucleation in Si-based structures,
M. S. Goorsky, P. Feichtinger, H. Fukuto, and G. U'Ren, Phil.
Trans. R. Soc. Lond. A 357, 2777 (1999).
Misfit dislocation formation in p/p+ silicon
vapor-phase epitaxy, H. Fukuto, P. Feichtinger, G. D.
U'Ren, S. Lindo, M. S. Goorsky, T. Magee, D. Oster, and J.
Moreland, J.
Crystal Growth 209, 716 (2000).
Structural defects in p/p+ silicon vapor
phase epitaxy, H. Fukuto, P. Feichtinger, M.S. Goorsky,
T. Magee, D. Oster, and J. Moreland, in Defects in Silicon
III, T. Abe, W.M. Bullis, S. Kobayashi, W. Lin, and P.
Wagner, Editors, p. 162, The
Electrochemical Society, Pennington, NJ (1999).
X-ray Topograhpy and diffraction studies
of misfit dislocation nucleation in Si-based structures, Goorsky,
M. S.; Feichtinger, P.; Fukuto, H.; U'Ren, G. D., accepted
in Phil. Trans., 1999.
Reduction of the bulk absorption
coefficient in silicon optics for high-energy lasers through
defect engineering, Goodman, W.A.; Goorsky, M.S., Appl.
Opt., vol.34, no.18 , 1995. p.3367-73.
Characterization of the damage
on the back side of silicon wafers. Defect and Impurity Engineered
Semiconductors and Devices, Lindo, S.E.; Matney, K.M.; Goorsky,
M.S., edited by: Ashok, S.; Chevallier, J.; Akasaki, I.; Johnson,
N.M.; Sopori, B.L. Symposium, Defect and Impurity Engineered
Semiconductors and Devices. (Pittsburgh, PA, USA: Mater.
Res. Soc., 1995). p.315-20.
A systematic study of the structural
and luminescence properties of p-type porous silicon, Yoon,
H.; Goorsky, M.S. edited by: Ashok, S.; Chevallier, J.; Akasaki,
I.; Johnson, N.M.; Sopori, B.L., Symposium, Defect and Impurity
Engineered Semiconductors and Devices. (Pittsburgh, PA, USA:
Mater. Res. Soc, 1995). p.893-8.
Material properties assessment
for large diameter single-crystal silicon, Goodman, W.A.;
Goorsky, M.S., Proc. SPIE - Int. Soc. Opt. Eng., vol.2543, Silicon
Carbide Materials for Optics and Precision Structures, 1995.
p.73-88.
High-quality strain-relaxed SiGe alloy grown on implanted
silicon-on-insulator substrate, Huang, F.Y.; Chu, M.A.; Tanner, M.O.; Wang, K.L.; U'Ren, G.D.;
Goorsky, M.S.
Appl. Phys. Lett., vol.76, (no.19), AIP, 8 May 2000. p.2680-2.
Influence of misfit strain
on {311} facet development in selective epitaxial growth of Si 1-xGe
xSi(100) grown by gas-source molecular beam epitaxy, U'Ren, G.D.; Goorsky, M.S.; Wang, K.L.
Thin Solid Films, vol.365, (no.1), Elsevier, 3 April 2000. p.147-50.
Thermal conductivity of Si/Ge superlattices, Borca-Tasciuc, T.; Weili Liu;
Jianlin Liu; Taofang Zeng; Song, D.W.; Moore, C.D.; Gang Chen; Wang, K.L.; Goorsky,
M.S.; Radetic, T.; Gronsky, R.; Xiangzhong Sun; Dresselhaus, M.S.
18 Int. Conf. on Thermoelectrics. Proceedings, ICT'99, Baltimore,
MD, USA, 29 Aug.-2 Sept. 1999.) Piscataway, NJ, USA: IEEE, 1999. p.201-4.
xix+736 pp.
Photoluminescence and X-ray characterization of relaxed Si/sub1-x/Ge/sub
x/ alloys grown on silicon on insulator SOI and implanted SOI
substrates, Chu, M.A.; Tanner, M.O.;
Huang, F.; Wang, K.L.; Chu, G.G.;Goorsky, M.S., J.
Cryst. Growth, vol.175-1762, 1997. p.1278-83.
Sidewall faceting and inter-facet
mass transport in selectively grown epitaxial layers on SiO/sub
2/-masked Si 110 substrates, Qi Xiang; Li Shaozhong; Wang
Dawen; Sakamoto, K.; Wang,K.L.; U'Ren, G.; Goorsky, M., J.
Cryst. Growth Netherlands , vol.175-176, pt.1, 1997. p.469-72.
Influence of substrate off-cut
on the defect structure in relaxed graded Si-Ge/Si layers,
Samavedam, S.; Romanato, F.; Goorsky, M.S.; Fitzgerald, E.A.
edited by: Michel, J.; Kennedy, T.; Wada, K.; Thonke, K., Defects
in Electronic Materials II., (Mater. Res. Soc, 1997). p.343-8.
Asymmetric mosaic spread during
relaxation in SiGe/Si strained layer superlattices grown on
miscut substrates, Nam, S.; Goorsky, M.S. in Strained
Layer Epitaxy - Materials, Processing, and Device Applications,
edited by: Fitzgerald, E.A.; Hoyt, J.; Cheng, K.-Y.; Bean, J.
(Pittsburgh, PA, USA: Mater. Res.
Soc, 1995). p.39-44.
Relaxed Si/sub 1-x/Ge/sub x/
films with reduced dislocation densities grown by molecular
beam epitaxy, Tanner, M.O.; Chu, M.A.; Wang, K.L.; Meshkinpour,
M.; Goorsky, M.S., J.
Cryst. Growth, vol.157, no.1-4, 1995. p.121-5.
X-ray Diffraction
Techniques |
Overgrowth of submicron-patterned surfaces for buried index contrast devices,
Koontz, E.M.; Petrich, G.S.; Kolodziejski, L.A.; Goorsky, M.S.
Semiconductor Science and Technology, vol.15, (no.4), IOP Publishing, April
2000. p.R1-12.
Asymmetry of misfit-dislocation induced satellite peaks in semiconductor
heterostructures, J. Leininger, G.D.
U'Ren, C.D. Moore, R. Sandhu, and M.S. Goorsky, J.
Phys. D, vol. 32, no. 10A, 1999. p.A8-A11.
Diffraction and topography measurements
of InP and InP-based heterostructure devices, Goorsky, M.S.,
in Physics of Semiconductor Devices, vol.1, edited by:
Kumar, V.; Agarwal, S.K., (Delhi, India: Narosa Publishing House,
1998). p.236-43.
Analysis of lattice distortions
in high-quality InGaAsP epitaxial overgrowth of rectangular-patterned
InP gratings, U'Ren, G.D.; Goorsky, M.S.; Koontz, E.M.;
Lim, M.H.; Petrich, G.S.; Kolodziejski, L.A.; Wong, V.V.; Smith,
H.I.; Matney, K.M.; Wormington, M., J.
Vac. Sci. Technol. B, Microelectron. Nanometer Struct.,
vol.16, no.3, 1998. p.1381-4.
Autostoichiometric vapor deposition.
III. A study of stoichiometry and characterization of epitaxial
LiTaO/sub 3/ layer, Chour, K.W.; Zhang, R.C.; Goorsky, M.S.;
Takada, T.; Akiba, E.; Kumagai, T.; Kawaguchi, K.; Jensen, M.L.;
Eaves, C.; Xu, R., J.
Cryst. Growth, vol.183, no.1-2 , 1998. p.217-26.
Characterization of ternary
substrate materials using triple axis X-ray diffraction,
Yoon, H.; Lindo, S.E.; Goorsky, M.S., J.
Cryst. Growth , vol.174, no.1-4, 1997. p.775-82.
Reciprocal space mapping for
semiconductor substrates and device heterostructures, Goorsky,
M.S.; Matney, K.M.; Meshkinpour, M.; Streit, D.C., Block, T.R.,
Nuovo Cimento D , vol.19D, no.2-4, 1997. p.257-66.
High resolution X-ray diffraction
analysis of GaN-based heterostructures grown by OMVPE, Goorsky,
M.S.; Polyakov, A.Y.; Skowronski, M.; Shin, M.; Greve, D.W.
III-V Nitrides. in Symposium, III-V Nitrides, edited
by: Ponce, F.A.; Moustakas, T.D.; Akasaki, I.; Monemar, B.A.,
(Mater. Res. Soc, 1997). p.489-94.
Photoluminescence and X-ray
characterization of relaxed Si/sub1-x/Ge/sub x/ alloys grown
on silicon on insulator SOI and implanted SOI substrates,
Chu, M.A.; Tanner, M.O.; Huang, F.; Wang, K.L.; Chu, G.G.;Goorsky,
M.S., J. Cryst.
Growth, vol.175-1762, 1997. p.1278-83.
Nondestructive analysis of structural
defects in wide bandgap II-VI heterostructures, Goorsky,
M.S.; Lindo, S.E.; Guha, S.; Haugen, G.M., J.
Electron. Mater. , vol.25, no.2, 1996. p.235-8.
Characterization of TaSi/sub
2/-Si composites for use as wide-bandpass optical elements for
synchrotron radiation, Stock, S.R.; Rek, Z.U.; Goorsky,
M.S., J. Appl. Phys.
USA , vol.79, no.9, 1996. p.6803-10.
X-ray diffuse scattering for
evaluation of wide bandgap semiconductor nuclear radiation detectors,
Goorsky, M.S.; Yoon, H.; Schieber, M.; James, R.B.; McGregor,
D.S.; Natarajan, M., Nucl.
Instrum. Methods Phys. Res. A, Accel. Spectrom. Detect. Assoc.
Equip., vol.380, no.1-2 , Room Temperature Semiconductor
X- and -Ray Detectors, Associated Electronics and Applications,
1996. p.6-9.
Diffuse X-ray scattering from
misfit dislocations at semiconductor hetero-interfaces,
Goorsky, M.S.; Meshkinpour, M.; Streit, D.C.; Block, T.R., J.
Phys. D, Appl. Phys., vol.28, no.4A, 1995. p.A92-6.
Determining period variations
in a distributed Bragg reflector through high resolution X-ray
analysis, Matney, K.; Goorsky, M.S., J.
Cryst. Growth, vol.148, no.4, 1995. p.327-35.
Period deviations in distributed
Bragg reflectors: X-ray diffraction and optical reflectivity
measurements, Matney, K.; Goorsky, M.S.; Tartaglia, J.;
Rai, R.; Parsons, C., in Proceedings of the Twenty-First
International Symposium on Compound Semiconductors, edited
by: Goronkin, H.; Mishra, U., (Bristol, UK: IOP Publishing,
1995). p.553-8.
Layer tilt and relaxation in
InGaAs/GaAs graded buffer layers, Matney, K.M.; Eldredge,
J.W.; Goorsky, M.S., in Strained Layer Epitaxy - Materials,
Processing, and Device Applications, edited by: Fitzgerald,
E.A.; Hoyt, J.; Cheng, K.-Y.; Bean, J. (Pittsburgh, PA, USA:
Mater. Res. Soc, 1995). p.73-8.
A new approach for determining
epilayer strain relaxation and composition through high resolution
X-ray diffraction, Matney, K.M.; Goorsky, M.S. in Strained
Layer Epitaxy - Materials, Processing, and Device Applications,
edited by: Fitzgerald, E.A.; Hoyt, J.; Cheng, K.-Y.; Bean, J.
(Pittsburgh, PA, USA: Mater. Res. Soc, 1995). p.257-62.
Characterization of buried pseudomorphic
InGaAs layers using high-resolution X-ray diffraction, Meshkinpour,
M.; Goorsky, M.S.; Matney, K.M.; Streit, D.C.; Block, T.R.,
J. Appl. Phys., vol.76,
no.6 , 1994. p.3362-6.
High resolution triple axis
diffractometry in indium-carbon and gallium-carbon co-implanted
gallium arsenide, Horng, S.T.; Madok, J.H.; Haegel, N.M.;
Goorsky, M.S., , in Materials Synthesis and Processing Using
Ion Beams, edited by: Culbertson, R.J.; Holland, O.W.; Jones,
K.S.; Maex, K. (Pittsburgh, PA, USA: Mater. Res. Soc, 1994).
p.655-60.